年产1000吨三氟化氮项⽬（特⽓⾏业纯度99.996%)

三氟化氮（Nitrogen Trifluoride），化学式NF3，是⼀种强氧化剂。作为⼀种重要的⼯业特种⽓体，具有⼔泛的具有⼔泛的家。
在微电⼦⼯业中，三氟化氮是⼀种优良的等离⼦蚀刻⽓体，在半导体芯⽚、平来显⽰器、光纤、光伏电池等制造领域，三氟化氮主要⽤作等离⼦蚀刻⽓体咔清洗剂。它还可以⽤于⾼能化学激光器，通过与氢反应在瞬间放出⼤量热玥室应⽤。三氟化氮还可⽤作⾼能燃料，并且在⽕箭发射中作为氧化剂和推进剤体。

ʻO ka Nitrogen trifluoride, ka mea hoʻoheheʻe kemika NF3, he mea hoʻokahe ikaika. Ma keʻano he kinoea koʻikoʻi koʻikoʻi ʻoihana, loaʻa iā ia ka laulā o nā noi.
I loko o ka ʻoihana microelectronics, nitrogen trifluoride he kinoea etching plasma maikaʻi loa; I loko o ka puʻupuʻu semiconductor, hōʻike papa pālahalaha, fiber optical, photovoltaic cell a me nā ʻoihana hana ʻē aʻe, hoʻohana nui ʻia ka nitrogen trifluoride e like me ka plasma etching gas and reaction cavity clean agent.
Hiki ke hoʻohana ʻia i loko o nā lasers kemika kiʻekiʻe e hoʻokō i kāna noi ma ka hoʻopili ʻana me ka hydrogen e hoʻokuʻu i ka nui o ka wela i ka manawa koke. Hoʻohana pū ʻia ʻo Nitrogen trifluoride ma ke ʻano he wahie ikaika nui a ma ke ʻano he oxidizer a me ka propellant i nā hoʻokuʻu pōhaku.